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Implant layout design rules | |
Design rules
| No. | Description | pharosc | sxlib | scmos-DEEP | scmos | Generic 0.13µm | |
|---|---|---|---|---|---|---|---|
| vsc | vx | ||||||
| 4.1a |
Implant - channel space |
5 |
5 |
5 |
3 |
3 |
0.28 |
| 4.1b |
Implant overlap of channel |
5 |
5 |
5 |
3 |
3 |
0.28 |
| 4.2a |
Implant overlap of ndif or pdif |
3 |
3 |
4 |
2 |
2 |
0.18 |
| 4.2b |
Implant overlap of ntie or ptie |
1 |
1 |
1 |
2 |
2 |
0.04 |
| 4.4 |
Implant width |
4 |
4 |
4 |
4 |
2 |
0.24 |
| 4.5a |
nimp - nimp, pimp - pimp space |
4 |
4 |
4 |
4 |
2 |
0.24 |
| 4.5b |
nimp - pimp space (overlap not allowed) |
0 |
0 |
0 |
0 |
0 |
0.0 |
| 4.6 |
Implant overlap of poly |
4 |
4 |
- |
- |
- |
0.24 |
Notes.
- SN, nimp and N-select are terms for N-implant; SP, pimp and P-select for P-implant; PD is diffusion covered by P-implant in NWELL; PS by P-implant in PWELL; ND by N-implant in PWELL and NS by N-implant in NWELL. PO is poly.
- Implant rules can be complex. Normally implant is drawn from the well layer and cut out for the opposite implant around well/substrate contacts.
- Butted contacts, where N and P implants divide a single diffusion geometry into separate N and P-diffusion areas can lead to complicated rules and may not be allowed by all foundries. They are not included here.
- DSM processes require poly to be covered by implant (rule 4.6).
IMPLANT layout design rules